[IEEE Technical Papers. International Symposium on VLSI Technology, Systems, and Applications - Taipei, Taiwan (June 3-5, 1997)] Proceedings of Technical Papers. International Symposium on VLSI Technology, Systems, and Applications - A Shallow-'ikench Isolation Study For 0.18pm Cmos Technology With Emphasis On The Effects Of Well Design, Channel-stop Implants, Trenchl Depth, And Salicide Process

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