[IEEE 2006 International Workshop on Junction Technology - Shanghai, China ()] 2006 International Workshop on Junction Technology - A Study of Nickel Silicide Formed on SOI Substrate with Different Ni/Co Thicknesses for Nano-scale CMOSFET
Soon-Yen Jung,, Soon-Young Oh,, Yong-Jin Kim,, Won-Jae Lee,, Ying-Ying Zhang,, Zhun Zhong,, Hi-Deok Lee,Year:
2006
Language:
english
DOI:
10.1109/iwjt.2006.220887
File:
PDF, 3.05 MB
english, 2006