![](/img/cover-not-exists.png)
[IEEE 2011 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Osaka, Japan (2011.09.8-2011.09.10)] 2011 International Conference on Simulation of Semiconductor Processes and Devices - A smart approach for process variation correlation modeling
Lin, Chung-Kai, Hsiao, Cheng, Chan, Wei-Min, Jeng, Min-ChieYear:
2011
Language:
english
DOI:
10.1109/sispad.2011.6034966
File:
PDF, 333 KB
english, 2011