Deep reactive ion etching of commercial PMMA in O...

Journal of Micromechanics and Microengineering 2004 / 05 Vol. 14; Iss. 5

Deep reactive ion etching of commercial PMMA in O 2 /CHF 3 , and O 2 /Ar-based discharges

Zhang, Congchun, Yang, Chunsheng, Ding, Duifu
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Volume:
14
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/14/5/001
Date:
May, 2004
File:
PDF, 257 KB
english, 2004
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