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[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - Inhibition of enhanced Cu oxidation on ruthenium
Ding, Shao-Feng, Xie, Qi, Waechtler, Thomas, Lu, Hai-Sheng, Schulz, Stefan E., Qu, Xin-PingYear:
2010
Language:
english
DOI:
10.1109/iitc.2010.5510315
File:
PDF, 10.59 MB
english, 2010