Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition
Warthesen, S.J., Kortshagen, U., Girshick, S.L.Volume:
33
Language:
english
Journal:
IEEE Transactions on Plasma Science
DOI:
10.1109/tps.2005.845321
Date:
April, 2005
File:
PDF, 368 KB
english, 2005