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[IEEE 6th International Conference on Solid-State and IC Technology - Shanghai, China (22-25 Oct. 2001)] 2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443) - 30 nm device channel profile optimization for digital application by using numerical simulation
Gongchuan Li,, Wenli Wang,, Liyun Qi,, Joardar, K.Volume:
2
Year:
2001
Language:
english
DOI:
10.1109/icsict.2001.982035
File:
PDF, 248 KB
english, 2001