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[IEEE 2007 International Symposium on Semiconductor Manufacturing - Santa Clara, CA, USA (2007.10.15-2007.10.17)] 2007 International Symposium on Semiconductor Manufacturing - Ambient gas control in slot-to-slot space inside FOUP to suppress Cu-loss after dual damascene patterning
Takao Kamoshima,, Yasuhisa Fujii,, Toshimitsu Noguchi,, Tomonori Saeki,, Yoshifumi Takata,, Hironori Ochi,, Akira Koiwa,Year:
2007
Language:
english
DOI:
10.1109/issm.2007.4446864
File:
PDF, 1.79 MB
english, 2007