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[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - O/sub 2/-plasma degradation of low-K organic dielectric and its effective solution for damascene trenches
Ching-Fa Yeh,, Yueh-Chuan Lee,, Yuh-Ching Su,, Kwo-Hau Wu,, Chein-Hsin Lin,Year:
2000
Language:
english
DOI:
10.1109/ppid.2000.870601
File:
PDF, 349 KB
english, 2000