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[IEEE 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Honolulu, HI, USA (June 13-15, 2006)] 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. - Advanced Dual Metal Gate MOSFETs with High-k Dielectric for CMOS Application
Hsu, P., Hou, Y., Yen, F., Chang, V., Lim, P., Hung, C., Yao, L., Jiang, J., Lin, H., Chiou, J., Yin, K., Lee, J., Hwang, R., Jin, Y., Chang, S., Tao, H., Chen, S., Liang, M., Ma, T.Year:
2006
Language:
english
DOI:
10.1109/vlsit.2006.1705192
File:
PDF, 812 KB
english, 2006