[IEEE 2005 13th International Conference on Advanced Thermal Processing of Semiconductors - Santa Barbara, CA, USA (04-07 Oct. 2005)] 2005 13th International Conference on Advanced Thermal Processing of Semiconductors - Multiple Reflection Effects During The In-SITU Calibration of an Emissivity Independent Radiation Thermometer
Brosilow, B.J., Naor, Y., Baharav, Y.Year:
2005
Language:
english
DOI:
10.1109/rtp.2005.1613710
File:
PDF, 2.28 MB
english, 2005