[IEEE 2001 International Semiconductor Device Research Symposium. Symposium - Washington, DC, USA (5-7 Dec. 2001)] 2001 International Semiconductor Device Research Symposium. Symposium Proceedings (Cat. No.01EX497) - Grain boundary controlled poly-Si TFT process employing selective si ion implantation and excimer laser annealing
Min-Cheol Lee,, In-Hyuk Song,, Min-Koo Han,Year:
2001
Language:
english
DOI:
10.1109/isdrs.2001.984445
File:
PDF, 379 KB
english, 2001