[IEEE 2006 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2006.09.25-2006.09.27)] 2006 IEEE International Symposium on Semiconductor Manufacturing - Improved CVD-Al Thin Film Using Superior Al Precursor
Ryu, Seung-Min, Cho, Jun-Hyun, Cho, Youn-Jaung, Lee, Jung-Ho, Choi, Jung-Sik, Lee, Dong-Jun, Cho, Kyoo-Chul, Kim, Tae-SungYear:
2006
Language:
english
DOI:
10.1109/issm.2006.4493118
File:
PDF, 2.16 MB
english, 2006