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Chemomechanical polishing of gallium arsenide to...

Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents

McMeekin, Scott G., Robertson, Max, McGhee, Laurence, Winfield, John M.
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Volume:
2
Year:
1992
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/jm9920200367
File:
PDF, 386 KB
english, 1992
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