Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents
McMeekin, Scott G., Robertson, Max, McGhee, Laurence, Winfield, John M.Volume:
2
Year:
1992
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/jm9920200367
File:
PDF, 386 KB
english, 1992