Electrochemical reduction vs. vapour deposition for...

Journal of the Chemical Society Faraday Transactions 1996 Vol. 92; Iss. 20

Electrochemical reduction vs. vapour deposition for n-GaAs/Cu Schottky-barrier formation: a comparative study

Vereecken, Philippe M., Vanalme, Greet M., Van Meirhaeghe, Roland L., Cardon, Felix, Gomes, Walter P.
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Volume:
92
Year:
1996
Language:
english
Journal:
Journal of the Chemical Society, Faraday Transactions
DOI:
10.1039/ft9969204069
File:
PDF, 2.34 MB
english, 1996
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