Chemomechanical polishing of gallium arsenide and cadmium...

Chemomechanical polishing of gallium arsenide and cadmium telluride to subnanometre surface finish. Evaluation of the action and effectiveness of hydrogen peroxide, sodium hypochlorite and dibromine as reagents

McGhee, Laurence, McMeekin, Scott G., Nicol, Irene, Robertson, Max I., Winfield, John M.
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Volume:
4
Year:
1994
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/jm9940400029
File:
PDF, 821 KB
english, 1994
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