[IEEE 2012 IEEE International Electron Devices Meeting...

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[IEEE 2012 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2012.12.10-2012.12.13)] 2012 International Electron Devices Meeting - Performance and reliability improvement in SiC power MOSFETs by implementing AlON high-k gate dielectrics

Hosoi, Takuji, Azumo, Shuji, Kashiwagi, Yusaku, Hosaka, Shigetoshi, Nakamura, Ryota, Mitani, Shuhei, Nakano, Yuki, Asahara, Hirokazu, Nakamura, Takashi, Kimoto, Tsunenobu, Shimura, Takayoshi, Watanabe
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Year:
2012
Language:
english
DOI:
10.1109/iedm.2012.6478998
File:
PDF, 328 KB
english, 2012
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