Effect of $\hbox{B}_{2}\hbox{H}_{6}$ Plasma Doping on the...

IEEE Electron Device Letters 2012 / 11 Vol. 33; Iss. 11

Effect of $\hbox{B}_{2}\hbox{H}_{6}$ Plasma Doping on the Shallow Trench Isolation in CMOS Image Sensor Device

Pyo, Sung Gyu, Park, Ji Hwan, Yang, Taek-Seung
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Volume:
33
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2012.2212233
Date:
November, 2012
File:
PDF, 783 KB
english, 2012
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