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[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Advantages of B/sub 18/H/sub 22/ ion implantation and influence on PMOS reliability
Ishibashi, M., Kawasaki, Y., Horita, K., Kuroi, T., Yamashita, T., Shiga, K., Hayashi, T., Togawa, M., Eimori, T., Ohji, Y.Year:
2005
Language:
english
DOI:
10.1109/iwjt.2005.203872
File:
PDF, 1.44 MB
english, 2005