Preparation of low density poly(methylsilsesquioxane)s for...

Preparation of low density poly(methylsilsesquioxane)s for LSI interlayer dielectrics with low dielectric constant. Fabrication of Ångstrom size pores prepared by baking trifluoropropylsilyl copolymers

Mikoshiba, Satoshi, Hayase, Shuzi
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Volume:
9
Year:
1999
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/a807068g
File:
PDF, 247 KB
english, 1999
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