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[IEEE 2013 13th International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2013.06.6-2013.06.7)] 2013 13th International Workshop on Junction Technology (IWJT) - Optimization of standard As ion implantation for NMOS Si bulk FinFETs extension
Sasaki, Yuichiro, De Keersgieter, An, Aik, Chew Soon, Chiarella, Thomas, Hellings, Geert, Togo, Mitsuhiro, Zschatzsch, Gerd, Thean, Aaron, Horiguchi, NaotoYear:
2013
Language:
english
DOI:
10.1109/iwjt.2013.6644496
File:
PDF, 1.84 MB
english, 2013