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Factors affecting photosensitivity enhancement of chemically amplified photoresists by an acid amplifier
Arimitsu, Koji, Kudo, Kazuaki, Ohmori, Hironori, Ichimura, KunihiroVolume:
11
Year:
2001
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/b007474h
File:
PDF, 219 KB
english, 2001