[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Impacts of gap thickness scaling on Thin-Film Transistors with suspended nanowire channels
Kuo, Chia-Hao, Hsu, Chia-Wei, Hsu, Hsing-Hui, Lin, Horng-Chih, Huang, Tiao-YuanYear:
2011
Language:
english
DOI:
10.1109/vtsa.2011.5872216
File:
PDF, 464 KB
english, 2011