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[IEEE 2000 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (13-15 June 2000)] 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - Practical benefits of the electromigration short-length effect, including a new design rule methodology and an electromigration resistant power grid with enhanced wireability
Wachnik, R.A., Filippi, R.G., Shaw, T.M., Lin, P.C.Year:
2000
Language:
english
DOI:
10.1109/vlsit.2000.852833
File:
PDF, 226 KB
english, 2000