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[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Characterization of Ge Films on Si(001) Substrates Grown by Nanocontact Epitaxy
Nakamura, Yoshiaki, Ikeda, Wataru, Kikkawa, Jun, Ichikawa, Masakazu, Sakai, AkiraYear:
2012
Language:
english
DOI:
10.1109/istdm.2012.6222506
File:
PDF, 305 KB
english, 2012