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Creation of nanoporous tantalum (Ta)-incorporated titanium (Ti) surface onto Ti implants by sputtering of Ta in Ar under extremely high negative substrate biases
Pham, Vuong-Hung, Jang, Tae-Sik, Jung, Hyun-Do, Kim, Hyoun-Ee, Koh, Young-HagVolume:
22
Year:
2012
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/c2jm35536a
File:
PDF, 719 KB
english, 2012