[IEEE 2011 11th International Workshop on Junction...

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[IEEE 2011 11th International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2011.06.9-2011.06.10)] 11th International Workshop on Junction Technology (IWJT) - Characterization of dopant diffusion, mobility, activation and deactivation effects for n-type dopants with long-dwell laser spike annealing

Chen, Shaoyin, Wang, Yun, Heidelberger, Christopher, Thompson, Michael
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Year:
2011
Language:
english
DOI:
10.1109/iwjt.2011.5970016
File:
PDF, 1.66 MB
english, 2011
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