[IEEE Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Kyoto, Japan (June 14-16, 2005)] Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Negative bias temperature instability in SOI and body-tied double-gate FinFETs
Hyunjin Lee,, Choong-Ho Lee,, Donggun Park,, Yang-Kyu Choi,Year:
2005
Language:
english
DOI:
10.1109/.2005.1469232
File:
PDF, 354 KB
english, 2005