[IEEE 2011 International Meeting for Future of Electron Devices, Kansai (IMFEDK) - Suita, Osaka, Japan (2011.05.19-2011.05.20)] 2011 International Meeting for Future of Electron Devices - Formation of electroless barrier for all-wet process of TSV in 3D-LSI technology and evaluation of its adhesion property
Arima, Ryohei, Inoue, Fumihiro, Yokoyama, Takumi, Miyake, Hiroshi, Shimizu, Tomohiro, Shingubara, Shoso, Tanaka, Shukichi, Terui, ToshifumiYear:
2011
Language:
english
DOI:
10.1109/imfedk.2011.5944847
File:
PDF, 216 KB
english, 2011