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[IEEE Proceedings of 17th Annual Electrical Overstress/Electrostatic Discharge Symposium - Phoenix, AZ, USA (1995.09.12-1995.09.14)] Electrical Overstress/Electrostatic Discharge Symposium Proceedings - ESD reliability impact of p+ pocket implant on double implanted NLDD MOSFET
Consiglio, R., Tiao Yuan Huang,Year:
1995
Language:
english
DOI:
10.1109/eosesd.1995.478285
File:
PDF, 312 KB
english, 1995