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[IEEE International Symposium on VLSI Technology Systems and Applications - Taipei, Taiwan (8-10 June 1999)] 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) - Analysis of hot-carrier degradation in 0.25-μm surface-channel pMOSFET devices
Liu, C.H., Chen, M.G., Shiang Huang-Lu,, Chang, Y.J., Fu, K.Y.Year:
1999
Language:
english
DOI:
10.1109/vtsa.1999.786005
File:
PDF, 223 KB
english, 1999