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[IEEE 2009 10th International Symposium on Quality of Electronic Design (ISQED) - San Jose, CA, USA (2009.03.16-2009.03.18)] 2009 10th International Symposium on Quality of Electronic Design - Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation
Sukharev, Valeriy, Markosian, Ara, Kteyan, Armen, Manukyan, Levon, Khachatryan, Nikolay, Choy, Jun-Ho, Lazaryan, Hasmik, Hovsepyan, Henrik, Onoue, Seiji, Kikuchi, Takuo, Kamigaki, TetsuyaYear:
2009
Language:
english
DOI:
10.1109/isqed.2009.4810286
File:
PDF, 562 KB
english, 2009