In depth analysis of complex interfacial processes: in situ...

In depth analysis of complex interfacial processes: in situ electrochemical characterization of deposition of atomic layers of Cu, Pb and Te on Pd electrodes

Huang, Minghua, Henry, John B., Fortgang, Philippe, Henig, Jörg, Plumeré, Nicolas, Bandarenka, Aliaksandr S.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
2
Year:
2012
Language:
english
Journal:
RSC Advances
DOI:
10.1039/c2ra21558f
File:
PDF, 1.48 MB
english, 2012
Conversion to is in progress
Conversion to is failed