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[IEEE 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - San Jose, CA, USA (April 17-21, 2005)] 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. - Influence of diffusion barrier on reliability. Identification of diffusion paths in CU / porous low K interconnect
Guillaumond, J.F., Arnaud, L., Guedj, C., Arnal, V., Besling, W.F.A., Reimbold, G., Dupeux, M., Torres, J.Year:
2005
Language:
english
DOI:
10.1109/relphy.2005.1493192
File:
PDF, 399 KB
english, 2005