Selective etching of SiO2 over Si3N4 in a C5F8/O2/Ar plasma

Microelectronic Engineering 2006 Vol. 83; Iss. 11-12

Selective etching of SiO2 over Si3N4 in a C5F8/O2/Ar plasma

Gwan-Ha Kim, Seung-Bum Kim, Chang-Il Kim
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Volume:
83
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2006.05.008
File:
PDF, 1.10 MB
english, 2006
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