Process-variation- and random-dopants-induced threshold...

Microelectronic Engineering 2007 Vol. 84; Iss. 9-10

Process-variation- and random-dopants-induced threshold voltage fluctuations in nanoscale CMOS and SOI devices

Yiming Li, Shao-Ming Yu, Hung-Ming Chen
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Volume:
84
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2007.04.059
File:
PDF, 466 KB
english, 2007
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