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Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films
N. Bahlawane, P. Antony Premkumar, K. Onwuka, G. Reiss, K. Kohse-HöinghausVolume:
84
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2007.05.014
File:
PDF, 174 KB
english, 2007