![](/img/cover-not-exists.png)
Stochastic simulation studies of molecular resists for the 32 nm technology node
D. Drygiannakis, G.P. Patsis, N. Tsikrikas, G. Kokkoris, A. Boudouvis, I. Raptis, E. Gogolides, P. ArgitisVolume:
85
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2007.12.072
File:
PDF, 546 KB
english, 2008