![](/img/cover-not-exists.png)
Process-variation- and random-dopants-induced threshold voltage fluctuations in nanoscale planar MOSFET and bulk FinFET devices
Yiming Li, Chih-Hong Hwang, Hui-Wen ChengVolume:
86
Year:
2009
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2008.02.013
File:
PDF, 593 KB
english, 2009