Process-variation- and random-dopants-induced threshold...

Process-variation- and random-dopants-induced threshold voltage fluctuations in nanoscale planar MOSFET and bulk FinFET devices

Yiming Li, Chih-Hong Hwang, Hui-Wen Cheng
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Volume:
86
Year:
2009
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2008.02.013
File:
PDF, 593 KB
english, 2009
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