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Characterization of negative-type photoresists containing polyhedral oligomeric silsesquioxane methacrylate
Ho-May Lin, Kuo-Hung Hseih, Feng-Chih ChangVolume:
85
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2008.03.012
File:
PDF, 829 KB
english, 2008