Exploring the limits of scanning electron microscopy for the metrology of critical dimensions of photoresist structures in the nanometer range
Ciappa, Mauro, Ilgünsatiroglu, Emre, Illarionov, Alexey Yu.Volume:
54
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2014.07.041
Date:
September, 2014
File:
PDF, 1.16 MB
english, 2014