Exploring the limits of scanning electron microscopy for...

Exploring the limits of scanning electron microscopy for the metrology of critical dimensions of photoresist structures in the nanometer range

Ciappa, Mauro, Ilgünsatiroglu, Emre, Illarionov, Alexey Yu.
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Volume:
54
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2014.07.041
Date:
September, 2014
File:
PDF, 1.16 MB
english, 2014
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