Influences of bottom electrode TaN on electrical characteristics for metal–HfO2–metal capacitors
Tsung-Kuei Kang, Chia-Tung Chang, Cheng-Li Lin, Wen-Fa WuVolume:
86
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2009.01.015
File:
PDF, 726 KB
english, 2009