Mechanism of selective Si3N4 etching over SiO2 in hydrogen-containing fluorocarbon plasma
Lele Chen, Linda Xu, Dongxia Li, Bill LinVolume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.04.016
File:
PDF, 426 KB
english, 2009