Fundraising September 15, 2024 – October 1, 2024 About fundraising

Mechanism of selective Si3N4 etching over SiO2 in...

Mechanism of selective Si3N4 etching over SiO2 in hydrogen-containing fluorocarbon plasma

Lele Chen, Linda Xu, Dongxia Li, Bill Lin
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.04.016
File:
PDF, 426 KB
english, 2009
Conversion to is in progress
Conversion to is failed