Three-level stencil alignment fabrication of a high-k gate...

Microelectronic Engineering 2011 Vol. 88; Iss. 8

Three-level stencil alignment fabrication of a high-k gate stack organic thin film transistor

Nenad V. Cvetkovic, Katrin Sidler, Veronica Savu, Jürgen Brugger, Dimitrios Tsamados, Adrian M. Ionescu
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Volume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.12.086
File:
PDF, 877 KB
english, 2011
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