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Ultrathin EOT high-κ/metal gate devices for future technologies: Challenges, achievements and perspectives (invited)
L.-Å. Ragnarsson, T. Chiarella, M. Togo, T. Schram, P. Absil, T. HoffmannVolume:
88
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2011.03.121
File:
PDF, 931 KB
english, 2011