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[IEEE 2009 IEEE International Integrated Reliability Workshop (IRW) - South Lake Tahoe, CA, USA (2009.10.18-2009.10.22)] 2009 IEEE International Integrated Reliability Workshop Final Report - Correlation of electrical properties with interface structures of CVD oxide-based oxynitride tunnel dielectrics
Liu, Ziyuan, Ishigaki, Hirokazu, Ito, Shuu, Ide, Takashi, Makabe, Mariko, Wilde, Markus, Fukutani, Katsuyuki, Kimura, Masahiro, Miha, Vlaicu A., Yoshikawa, HidekiYear:
2009
Language:
english
DOI:
10.1109/irws.2009.5383009
File:
PDF, 440 KB
english, 2009