[IEEE [1993 International Workshop on VLSI Process and...

  • Main
  • [IEEE [1993 International Workshop on...

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - A New Hydrodynamic Model For High Energy Tail Electrons

Jae-gyung Ahn,, Young-june Park,, Hong-shick Min,
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
1993
Language:
english
DOI:
10.1109/vpad.1993.724709
File:
PDF, 223 KB
english, 1993
Conversion to is in progress
Conversion to is failed