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[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - A New Hydrodynamic Model For High Energy Tail Electrons
Jae-gyung Ahn,, Young-june Park,, Hong-shick Min,Year:
1993
Language:
english
DOI:
10.1109/vpad.1993.724709
File:
PDF, 223 KB
english, 1993