![](/img/cover-not-exists.png)
Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, and solutions
D. Goguenheim, D. Pic, J.L. OgierVolume:
47
Year:
2007
Language:
english
Pages:
8
DOI:
10.1016/j.microrel.2007.07.048
File:
PDF, 473 KB
english, 2007