[IEEE 2005 International Semiconductor Device Research...

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[IEEE 2005 International Semiconductor Device Research Symposium - Bethesda, Maryland, USA (Dec. 7-9, 2005)] 2005 International Semiconductor Device Research Symposium - An Assessment of Single-Electron Effects in Multiple-Gate SOI MOSFETs with 1.6-nm Gate Oxide near Room Temperature

Wei Lee,, Pin Su,, Hou-Yu Chen,, Chang-Yun Chang,, Ke-Wei Su,, Sally Liu,, Fu-Liang Yang,
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Year:
2005
Language:
english
DOI:
10.1109/isdrs.2005.1596039
File:
PDF, 331 KB
english, 2005
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