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[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - Feasibility study of plasma doping on Si substrates with photo-resist patterns
Aiba, I., Sasaki, Y., Okashita, K., Tamura, H., Fukagawa, Y., Tsutsui, K., Ito, H., Kakushima, K., Mizuno, B., Iwai, H.Year:
2005
Language:
english
DOI:
10.1109/iwjt.2005.203886
File:
PDF, 1.19 MB
english, 2005